Abstract
IT is now generally recognized that high-resolution dark-field electron microscopy is essential for a comprehensive study of inperfections in crystalline materials. However, commercial electron microscopes have not been designed in the past with this technique in mind, and consequently the amount of dark-field work that has been carried out to date is limited and has only been possible as a result of a considerable amount of perseverance on the part of the operator. Moreover, the operation has taken so long that injurious contamination of the specimen has occurred. A technique has now been developed here in co-operation with Associated Electrical Industries, Ltd., which allows a suitably modified E.M.6 electron microscope to be used with equal facility for high-resolution dark-field or light-field work.
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References
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HALE, K., MCLEAN, D. A New High-resolution Dark-field Electron Microscope Technique. Nature 201, 696 (1964). https://doi.org/10.1038/201696a0
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DOI: https://doi.org/10.1038/201696a0
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