Abstract
LAYERS and “whiskers” of silicon carbide have been made in several investigations1 by the thermal decomposition of the vapour of trichloromethylsilane (CH3SiCl3). The experimental conditions used have varied widely, however, and there has been little information about what controls the morphology of the silicon carbide produced by this method. In recent work it has been shown that the form of deposit obtained is determined mainly by the flux of the vapour species. Layers are formed above a critical flux, while filamentary deposits are formed below it.
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References
For example, see: Popper, P., and Mohyuddin, I., in Special Ceramics 1964, edit. by Popper, P., 45 (Academic Press, London and New York, 1965). Kirchner, H. P., and Knoll, P., J. Amer. Ceram. Soc., 46 (6), 299 (1963).
Jenkins, A. C., and Chambers, G. F., Industr. Eng. Chem., 46, 2367 (1954).
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NOONE, M., ROBERTS, J. Pyrolytic Deposits of Silicon Carbide. Nature 212, 71 (1966). https://doi.org/10.1038/212071a0
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DOI: https://doi.org/10.1038/212071a0
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