Figure 1 | NPG Asia Materials

Figure 1

From: Charge transport and morphology of pentacene films confined in nano-patterned region

Figure 1

Scanning electron microscopy (SEM) images of photoresist (PR) pattern. (a) Micro-scale patterns consist of similarly spaced PR and silicon dioxide (SiO2) surface-modified poly(methyl methacrylate) (PMMA) thin-film alternately. (b) Nano-scale patterns consist of 2 μm width PR and ∼250 nm SiO2 layer, alternately. The heights of micro- and nano-scale patterns are 450 nm and 250 nm, respectively.

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