Figure 9

AFM topographies of PF14-b-Piso10 and PF14-b-Piso60 thin films on a pre-strained PDMS substrate that was released back to the unstretched state (that is, 0%) and then restrained to 20 and 40%, respectively. AFM, atomic force microscopy; PDMS, poly(dimethylsiloxane); PF, poly[2,7-(9,9-dihexylfluorene)]; Piso, poly(pendent isoindigo).