Figure 1
From: Metal–organic frameworks: The future of low-κ materials

The reported dielectric constants (3.04–2.33) for MOFs adhere to the timescale for the development of future low-κ interlayer dielectric materials set by the International Technology Roadmap for Semiconductors (ITRS). Some MOFs have dielectric constants that meet the current standards for low-κ materials, and several current materials have dielectric constants low enough to meet future standards for low-κ materials, up to the year 2021 (ITRS graph has been copied from Baklanov et al.6 Creative Commons license can be found at https://creativecommons.org/licenses/by-nc-nd/4.0/).