Table 1 Electrical parameters of the undoped and doped devices fabricated through the homogeneous dewetting method

From: Homogeneous dewetting on large-scale microdroplet arrays for solution-processed electronics

Dopants

Maximum sat. mobility (cm2V1s1)

Average sat. mobility (cm2V1s1)

Threshold voltage (V)

Subthreshold slope (V/dec)

Log (Ion/Ioff)

Contact resistance (k Ωcm) a

Non

9.2

3.4±1.7

3.4±1.6

0.45±0.21

8.78±0.43

14.9

MoO3

13.1

5.5±2.8

1.7±0.7

0.35±0.13

8.05±0.35

3.8

V2O5

11.6

6.1±2.5

2.0±1.1

0.90±0.47

7.92±0.28

7.7

WO3

10.0

4.4±1.9

0.7±0.2

0.56±0.28

7.85±0.33

13.2

  1. aThe width-normalized contact resistances were extracted in the linear regimes at Vgs of −40 V.