Figure 2 | Light: Science & Applications

Figure 2

From: Simultaneous additive and subtractive three-dimensional nanofabrication using integrated two-photon polymerization and multiphoton ablation

Figure 2

Fundamentals of multiphoton ablation. (a) Schematics of multiphoton absorption; (b) absorbance and transmittance spectra of cured IP-L photoresist; (c) SEM image of the hole-matrix pattern created on a cured IP-L polymer film of 200-nm thickness by fs laser ablation (laser power: 16 mW; exposure time/spot: 0.5 ms). The scale bar is 1 µm; (d) magnified image of a hole. fs, femtosecond; SEM, scanning electron microscope.

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