Figure 8

(a) Schematic diagram of the concept for photoinduced deactivation of photopolymerization. The excitation and deactivation beams are both focused in the prepolymer resin with a lateral separation of Δx. The substrate is translated perpendicular to the separation axis to fabricate polymer lines. (b) Plan-view SEM image of lines written with offset (Δx>0), 200 fs excitation pulses and 50 ps deactivation pulses. When the deactivation beam was chopped, the linewidth was significantly thicker.⁷⁵ Reproduced with permission from AAAS. ©2009 by the American Association for the Advancement of Science. SEM, scanning electron microscopy.