Figure 2
From: Ultrafast laser processing of materials: from science to industry
Tennant’s scaling: state-of-the-art of nanotechnology in 2003 for the resolution vs. throughput R=2.35 T2D (Ref. 27). Direct 3D laser writing for polymerization28 with T ≃ 109 μm3 h–1, Bragg grating recording by Bessel–Gauss fs-beam in glass14, surface ripple formation on crystals/glasses29 are marked along with the Tennant’s law predictions rescaled for the 3D C × 106 μm3 h–1 with C=32.2 taken from the speed of protein production in ribosome30 (see text for details). The size of elliptical markers is representative of the resolution span; the current 22 nm node of modern CMOS lithography is marked by an arrow.
