Figure 2 | Microsystems & Nanoengineering

Figure 2

From: High-aspect-ratio nanoimprint process chains

Figure 2

Schematic representation of a double cryo-etch process with one single PMMA layer depicted as follows: (a) Spin coating of the poly(methyl methacrylate) (PMMA) layer. (b) EBL for nanostructures. (c) First cryo-etch process on nanostructures. (d) EBL for microstructures. (e) Simultaneous etch of micro- and nanostructures. (f) Removal of the PMMA layer.

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