Figure 4: BCP nanopatterns with user-defined diagrams.
From: Directed block copolymer self-assembly implemented via surface-embedded electrets
(a) Surface potential image of a Tai Chi diagram fabricated by e-beam irradiation with EBD. (b,c) SEM images of the corresponding self-assembled morphology of PS(53k)-b-PMMA(54k) film (thickness: 56 nm). Spatially oriented PS(46k)-b-PMMA(21k) film with various geometries: (d) patterned array of stars; (e) magnified view of d; (f) pattern of letters NANO. The film thickness in d,e and f is 37 nm. Scale bars, 2 μm (a,b); 500 nm (c); 5 μm (d); 200 nm (e); 500 nm (f).
