Figure 5: High-resolution BCP patterns realized by e-beam control.
From: Directed block copolymer self-assembly implemented via surface-embedded electrets
(a) Schematic process of high-resolution perpendicular cylindrical BCP nanopattern self-assembled on charged electrets with controlled circular size and e-beam dose. (b–e) SEM images of individual hole and patterned holes of PS-b-PMMA film after PMMA-block removal (scale bars, 200 nm). Each hole corresponds to the position of a vertically oriented PMMA microdomain of PS-b-PMMA film. The film thickness is 37 nm.
