Figure 1: The schematic diagram and morphology characterizations.

(a) The procedures for growing ternary MoS2(1−x)Se2x particles on porous NiSe2 foam. (b,c) Typical SEM images showing the surface roughness of the NiSe2 foam grown at 600 °C from commercial Ni foam. (d,e) Typical SEM images showing the morphologies of ternary MoS2(1−x)Se2x particles distributed on porous NiSe2 foam grown at 500 °C. (b,d) Scale bar, 50 μm. (c,e) Scale bar, 1 μm.