Figure 2: Homogeneous metal distribution in bulk MoS2.

(a) Zero-valent intercalation of metal nanoparticles by an in-situ reduction strategy. (b) ToF-SIMS maps at the beginning (0 s), middle (300 s) and end (600 s) of the experiment. The false colours of blue and red corresponds to MoS2− (162 amu) and Pt− (195 amu). (c) ToF-SIMS side view and (d) depth profile of the same region (etching depth is roughly 400 nm, as calculated by the step of 300 nm SiO2/Si wafer). Scale bar, 20 μm.