Figure 1: Schematic illustration of fabrication procedures to produce 3D PDMS.
From: Three-dimensional nanonetworks for giant stretchability in dielectrics and conductors
(a) Conformal contact of a PDMS phase mask against a film of a positive-tone photoresist. (b) Generation of complex 3D distributions of intensity in the photoresist by interference of ultraviolet light (wavelength~355 nm) diffracted by passage through the mask. (c) Washing away the exposed soluble regions using water-based developing solution. (d) Infiltration of PDMS prepolymer into the 3D template, followed by a second flood exposure. (e) Removal of the 3D template and releasing layer (hard-baked photoresist) in a developer bath. (f) Retrieving the floating PDMS membrane and drying it with a stream of air. Scale bar, 2 cm.
