Figure 2: Analysis of the plasma gating process.
From: Single-shot pulse duration monitor for extreme ultraviolet and X-ray free-electron lasers
(a) Electron density, ne, within the conduction band of fused silica as a function of the fluence of an 80-fs XUV pulse, calculated using a dedicated Monte-Carlo simulation for different wavelengths, 41.5 nm (red line), 13.6 nm (blue dashed line) and 5.5 nm (black line). The grey shaded region represents the linear absorption regime for fluences below 0.05 Jcm−2. The experimental conditions were chosen accordingly. (b) Calculated transmission G(t) (red) generated by the temporal plasma evolution of an absorbed Gaussian FEL pulse with 105 fs pulse duration (grey).
