Figure 1: Structural characterization of films comprised of uncoated nanocrystals.
(a) XRD patterns of ZnO nanocrystals produced using the same plasma synthesis conditions but with different post processing: as-deposited (blue) and after annealing at 340 °C in 20% H2 in Ar for 60 min (red). The calculated crystallite sizes (xs) were 4.8±1 nm and 22±5 nm for the as-deposited and the annealed nanocrystal films, respectively. The XRD patterns in a have been offset for clarity. Representative cross-sectional SEM images of ZnO nanocrystal films on silicon substrates processed at the same conditions as panel a, (b) as-deposited and (c) after annealing. The scale bars in b and c are 500 nm.
