Figure 1: Characterization at low field.

(a) Schematic of the device, consisting of a graphene/h-BN/graphite stack resting on SiO2. VBG is applied to the graphite back gate to tune the carrier density. (b) ρxx(n) in logarithmic scale, measured at B=0 T and T=4 K. Inset: ρxx(n, B) at very low field and density. (c) Fan diagram of ρxx(n, B) up to 11 T.