Figure 2: Microstructure characterization of the as-deposited Pd film.

(a) ACOM-TEM orientation mapping of a plan-view FIB sample with 200-nm scale bar. The film has been thinned to obtain one grain through the thickness. (b) Inverse pole figure showing the {110} preferential orientation of the grains in the direction perpendicular to the film. (c) Inverse pole figure showing the random orientation of the grains in the direction parallel to the film, that is, in the tensile direction. (d) Grain size distribution of the as-deposited Pd film obtained from the ACOM-TEM map presented in a. The grain size distribution has been determined using a grain tolerance angle of 10°. (e) Bright field micrograph obtained on cross-sectional FIB sample with two or three grains over the thickness with 50-nm scale bar. (f) HRTEM image showing a Σ3 60° {111} growth nanotwin with perfectly coherent TBs with 5-nm scale bar.