Figure 1: Schematic of the growth process for molybdenum disulphide using patterned molybdenum sources. | Nature Communications

Figure 1: Schematic of the growth process for molybdenum disulphide using patterned molybdenum sources.

From: Seeded growth of highly crystalline molybdenum disulphide monolayers at controlled locations

Figure 1

An array of square wells is patterned in a conventional lithographic resist. The wells are filled by spin coating with ammonium heptamolybdate ((NH4)6Mo7O24·4H2O, AHM) solution or thermal evaporation of molybdenum trioxide (MoO3). The resist is removed in a lift-off process. Water droplets are condensed onto the AMH or MoO3 by reducing the sample temperature to below the dew point using a Peltier cooler. The AMH or MoO3 is solubilized and forms spherical beads upon drying. MoS2 flakes are then synthesized by sublimation of solid S in a nitrogen environment in a tube furnace.

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