Figure 1: Schematic illustration of the experimental steps for the formation of MoSe2/MoS2 heterojunction arrays. | Nature Communications

Figure 1: Schematic illustration of the experimental steps for the formation of MoSe2/MoS2 heterojunction arrays.

From: Patterned arrays of lateral heterojunctions within monolayer two-dimensional semiconductors

Figure 1

(a) Starting MoSe2 monolayer crystal. (b) MoSe2 is patterned by e-beam lithography and SiO2 deposition, followed by sulfurization of uncovered areas. The SiO2 mask is used to prevent the underlying MoSe2 regions from reacting with sulfur while the exposed regions are converted to MoS2. (c) Formation of arrays of lateral MoSe2/MoS2 heterojunctions within the monolayer crystal.

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