Abstract
Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) was synthesized and evaluated as a new matrix polymer for a deep UV resist. The polymer has low absorbance at 248 nm (absorbance: 0.014–0.034 μm−1) and good thermal stability up to 250°C. The diffusion lengths of photo-generated acid in the resist films were studied for various fractions of the basic monomer in the copolymers. The results show that the copolymer with a basic monomer can control acid diffusion. 0.25 μm line/space patterns were obtained for this resist system using a KrF excimer laser stepper. The pattern profile was not deformed and T-top was not observed after 2h post-exposure delay. The polymer has etch resistance comparable to the novolac resist under CHF3 plasma.
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References
R. D. Allen, W. E. Conley, and R. R. Kunz, in “Handbook of Microlithography, Micromachining, and Microfabrication, “Vol. 1, P. Rai-Choudhury, Ed., SPIE Optical Engineering Press, Washington, 1997, Chapter 4, p 321.
H. Ito, Solid State Technol., 164 (July 1996).
S. A. McDonald, N. J. Cleeak, H. R. Wendt, C. G .Willson, C. D. Snyder, C. J. Knors, N. B. Deyoe, J. G. Maltables, J. R. Morrow, A. E. McGuire, and S. J. Holmes, Proc. SPIE, 1446, 2 (1991).
O. Nalamsu, M. Cheng, A. G. Timko, V. Pol, E. Reichmanis, and L. F. Thompson, J. Photopolym. Sci. Technol., 4, 299 (1991).
H. Ito, G. Breyta, D. Hofer, R. Sooriyakumaran, K. A. Petrillo, and D. J. Seeger, J. Photopolym. Sci. Technol., 7, 433 (1994).
W.-S. Huang, R. Kwong, A. Katnani, and M. Khojasteh, Proc. SPIE, 2195, 37 (1994).
C. Mertesdorf, N . Munzel, H. Holzwarth, P. Falcigno, H. Schacht, O. Rohde, R. Schulz, S. G. Slater, D. Fey, O. Nalamasu, A. Timko, and T. Neenan, Proc. SPIE, 2438, 84 (1995).
H. Roschert, K. J. Przybilla, W. Spiess, H. Wingenroth, and G. Pawlowski, Proc. SPIE, 1672, 33 (1993).
Y. Kawai, A. Otaka, A. Tanaka, and T. Matsuda, Jpn. Appl. Phys., 33, 7023 (1994).
J.-B. Kim, M.-H. Jung, and K.-H. Chang, Polym. Bulletin, 38, 241 (1997).
J.-B. Kim, M.-H. Jung, J.-H. Cheong, and J.-Y. Kim, J. Photopolym. Sci. Technol., 10, 493 (1997).
J.-B. Kim, J.-H. Choi, Y.-G. Kwon, M.-H. Jung, and K.-H. Chang, Polymer., 40, 1087, (1998).
Y. Kaimoto, K. Nozaki, S. Takechi, and N. Abe, Proc. SPIE, 1672, 66 (1992).
S. Takechi, M. Takahashi, A. Kotachi, K. Nozaki, E. Yano, and I. Hanyu, J. Photopolym. Sci. Technol., 9, 475 (1996).
N. Shida, T. Ushirogouchi, K. Asakawa, and M. Nagase, J. Photopolym. Sci. Technol., 9, 457 (1996).
R. D. Allen, G. M. Wallraff, R. A. Dipietro, D. C. Hofer, and R. R. Kunz, Proc. SPIE, 2438, 474 (1995).
K. Nakano, K. Maeda, S. Iwasa, J. Ogura, and E. Hasegawa, Proc. SPIE, 2195, 195 (1994).
K. Maeda, K. Nakano, T. Ohfuji, and E. Hasegawa, Proc. SPIE, 2724, 377 (1996).
J. L. Dekar and N. P. Hacker, J. Am. Chem. Soc., 112, 6004 (1990).
K. Asakawa, T. Ushirogouchi, and M. Nakase, Proc. SPIE, 2438, 563 (1995).
K. Asakawa, J. Photopolym. Sci. Technol., 6, 505 (1993).
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Kim, JB., Choi, JH., Kim, H. et al. Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) for an Environmentally Stable Chemically Amplified Resist. Polym J 31, 695–699 (1999). https://doi.org/10.1295/polymj.31.695
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DOI: https://doi.org/10.1295/polymj.31.695
