Table 1 Third-order susceptibility for Si:P and Si:Bi both on and off-resonance
From: Highly efficient THz four-wave mixing in doped silicon
Si:P | Si:Bi | ||||||
---|---|---|---|---|---|---|---|
\(\hbar\)ω (meV) | 32.5 | 34.0 | 36.7 | 39.2 | 42.5 | 64.5 | |
– | (2p0) | – | (2p±) | (3p±) | (2p±) | ||
T | R | T | T | R | R | R | |
L (mm) | 0.6 | 0.5 | 0.5 | 0.6 | 0.5 | 0.5 | 1 |
nD | 10 | 1.0 | 1.0 | 10 | 1.0 | 1.0 | 3.4 |
x | 1.6 | 4.7 | 5.6 | 2.3 | 4.6 | 3.9 | 4.9 |
r0 (mm) | 0.53 | 0.6 | 0.6 | 0.53 | 0.6 | 0.6 | 0.64 |
Ec (μJ) | 2.7 | 4.9 | 32.3 | 1.1 | 1.4 | 2.1 | 0.17 |
f | 3.0 | 28 | 6.1 | 6.2 | 310 | 27 | 310 |
\({\chi }_{\,\text{expt}\,}^{(3)}L\) | 0.13 | 0.80 | 0.025 | 0.58 | 27 | 1.5 | 160 |
\({\chi }_{\,\text{expt}\,}^{(3)}\) | 0.22 | 1.6 | 0.050 | 0.96 | 54 | 2.9 | 160 |
\({\chi }_{\,\text{expt}\,}^{(3)}/{n}_{{\rm{D}}}\) | 0.022 | 1.6 | 0.050 | 0.096 | 54 | 2.9 | 46 |
μeg (e.nm) | – | 0.37 | – | – | 0.71 | 0.32 | 0.34 |
\(\hbar\)/T1 (μeV) | – | 11 | – | – | 5 | 3.9a | 19 |
\(\hbar\)/T2 (μeV) | – | 26 | – | – | 26 | 109 | 44 |
\(\hbar /{T}_{2}^{* }\) (μeV) | – | 115 | – | – | 115b | 194 | 165 |
\({\chi }_{\,\text{theory}\,}^{(3)}/{n}_{{\rm{D}}}\) | 0.0024 | 100 | 0.015 | 3100 | 23 | 18 |