Table 2 Summary of LIBWE studies on different transparent hard materials
Substrate materials | Laser wavelength and pulse duration | Absorptive liquid | Fabricated structures and applications | References |
|---|---|---|---|---|
Fused silica | 248 nm, 30 ns | Pyrene/Acetone solution | Grating microstructures | |
351 nm, 30 ns | Pyrene in acetone, tetrachloroethylene, or toluene | Laser etching | ||
248 nm, 30 ns | Pyrene/Acetone solution | Micro-trench | ||
248 nm, 25 ns | Mercury | Laser etching of groove | ||
248 nm, 20 ns | Liquid gallium | Laser etching of micro-pits | ||
266 nm and 355 nm, 10 ps | Toluene | Micro-grooves | ||
248 nm, 30 ns | The naphthalene-1,3,6-trisulfonic acid trisodium salt | Periodic line and grid patterns | ||
308 nm, 20 ns | Pyrene/Acetone solution | Micro-etching of grating structures | ||
Silica glass | 800 nm, 120 fs | Distilled water | 3D micro-holes | |
800 nm, 40 fs | Distilled water | 3D mciro-channels | ||
800 nm, 120 fs | Distilled water | 3D microfluidic chips | ||
Foturan glass | 1045 nm, 457 fs | Distilled water | Glass microfluidic structures | |
Alumino-borosilicate glass | n.s., 250 fs | Water | Opto-mechanical modulators | |
Soda-lime glass slide | 1064 nm, n.s. | CuSO4 | Laser etching and cutting | |
Quartz | 355 nm, 30 ns | Toluene | Micro-channel fabrication | |
248 nm and 308 nm, 30 ns | Pyrene/acetone solution | Fresnel lens | ||
308 nm, 30 ns and 200 ns | Pyrene in tetrahydrofuran | Micro-lens array | ||
Sapphire | 1064 nm, 100 ns | CuSO4 | Laser etching and cutting | |
266 nm, 150 ps | Chlorobenzene | Periodic gratings | ||
248 nm, 30 ns | Solution of pyrene/acetone or neat toluene | Laser patterning, grating structures | ||
CaF2 | 248 nm, 30 ns | Pyrene in acetone, tetrachloroethylene or cyclo-hexane | Laser etching |
