Table 1 Comparison of typical mid-IR QD photodetectors

From: High-operating-temperature mid-infrared photodetectors via quantum dot gradient homojunction

Device

Wavelength nm

Bias V

T K

D* Jones

A/W

ref

(epitaxial) PV/GaAs substrate/n+ GaAs /GaAs/ n+ InAs QD/ GaAs barrier/ AlGaAs barrier/ GaAs contact

~4300

2

100

1011

/

4

170

1010

0.12

(epitaxial) PV/ InAs QD/ AlGaAs barrier

~5000

2

100

2 × 109

0.2

48

(epitaxial) InP substrate/InAs QD

~4100

5

120

2.8 × 1011

/

49

300

6.7 × 107

/

(epitaxial)PV/ Si substrate/Ge QD/Si

3000~5000

2

90

8 × 1010

0.25

50

(colloidal) PC/HgTe QD with EDT

~5000

5

80

6.1 × 108

/

12

200

2.5 × 108

/

295

5 × 107

0.1

(colloidal) PC/ HgTe QD with As2S3

~3500

3

100

3.5 × 1010

/

14

200

2.37 × 1010

0.052

300

1.54 × 109

0.01

(colloidal)PV/CaF2/NiCr/HgTe QD/Ag

~3700

0

90

4.2 × 1010

0.08

17

200

1 × 109

0.01

290

1.2 × 107

0.001

(colloidal) PV/ITO/HgTe QD /Ag2Te QD /HgCl2/Au

~3700

0

80

1 × 1011

0.4

18

200

1 × 1010

0.46

295

3 × 108

0.08

(colloidal) PV/ITO/metal disks/ HgTe QD /Ag2Te QD / Optical spacer/Au

~4400

0

85

4 × 1011

1.6

20

200

1.5 × 1010

/

300

7.2 × 108

/

(colloidal) PC /HgTe QD with hybrid ligands

~3770

1.5

80

5.4 × 1010

0.2

13

200

2 × 109

/

300

6 × 107

/

(colloidal) PV/ HgTe QD

~4400

0

80

2.7 × 1011

2.7

This work

200

1011

2.0

280

1010

0.6

300

7.6 × 109

0.58