Fig. 1: Schematic illustration of multi-beam processing in YAG crystal with SLM-based femtosecond laser system.
From: Nanoscale multi-beam lithography of photonic crystals with ultrafast laser
a SLM holograms used to generate a simple multi-beam light field. b Description of hologram phase for complicated light field. c Multi-beam light field shaping with superimposed phase hologram. d Diagram of multi-beam scanning strategy. e Diagram of Debye diffraction integral, P represents the pupil, L represents the objective lens, and F represents the focusing region
