Fig. 2: Demonstration of double-channel processing.
From: Nanoscale multi-beam lithography of photonic crystals with ultrafast laser
a i) Simulated intensity distribution of single beam in x–y plane; ii) Intensity profile of single beam; iii) top view optical micrography of conventional single beam processing result; iv side view optical micrography of conventional single beam processing result. b i) Simulated intensity distribution of double beams in x–y plane; ii Intensity profile of double beams; iii) top view optical micrography of double beams processing result; iv) side view optical micrography of double beams processing result. c SLM phase holograms and experimental results for different stripe numbers K. d Measured gap and channel width against different stripe numbers K. e Measured gap and channel width against different pulse energy
