Fig. 5: Correction of nanophotonic patterns using real-time nearfield microscopy as a feedback to wavefront shaping.
From: Dynamic control and manipulation of near-fields using direct feedback
a Au film patterned with coupling grating containing random structural defects. b calculated plasmonic pattern expected from the experimental conditions with no phase correction—2nd order plasmonic Bessel beam. c The measured pattern is severely distorted owing to the structural defects. The inset shows the uniform phase imprinted on the SLM, i.e., no phase correction. d The corrected plasmonic pattern after the phase closed-loop phase correction achieved using the real-time acquisition of the near-field pattern. The inset shows the phase pattern imprinted on the SLM
