Fig. 1: Schematic of indirect photopatterning of RGB EML in the SPN structure.

a Process flow for the indirect photopatterning of the first EML pattern in the SPN structure. In the circled schematics, green circles and purple rectangles represent hosts and dopants, respectively. b Process flow for the indirect photopatterning of the second and third EML patterns in the SPN structure. c Side view of the conventional/direct photopatterning steps for the second EML pattern; the steps show the possibility of dissolution and contamination of the underlying EML pattern. d Side view of the indirect photopatterning steps for the second EML pattern, emphasizing the absence of both direct UV irradiation of the EML and direct contact of the EML with the subsequently deposited emissive color material