Fig. 4 : Impact of Parameter Uncertainty and Fabrication Tolerances.
From: Twist-Induced Beam Steering and Blazing Effects in Photonic Crystal Devices
a Sensitivity of the figure of merit for different perturbation magnitudes of the layer depths. Perturbations are considered as a percentage of the pitch \(\Lambda\) b Sensitivity of the in-plane features to perturbations. c Design proposition specific to two-photon polymerizations using the ellipses archetype (\(N=12\)) and IP-DIP material, a high-refractive-index, negative-tone photoresist tailored for two-photon polymerization
