Table 1 Comparison of nano-fabrication methods for diffractive optical processors

From: Broadband unidirectional visible imaging using wafer-scale nano-fabrication of multi-layer diffractive optical processors

Methods

Maximum lateral size (μm)

Lateral feature size (nm)

Axial step size (nm)

Number of phase levels per feature

Number of independent phase features per chip

Wafer-level multi-layer fabrication

Two-photon polymerization9,31,42,52

<100

~300–400

~10–300

>100

<0.1 million

No

Optical Fourier surfaces43,44

<200

~20–400

~20

>100

<1 million

No

Resin stamping53

>1000

4000

~160

8

<5 million

No

Mask-less grayscale exposure54,55

>1000

3000

~125

16

<4 million

No

This work

>1000

714

~100

16

~0.5 billion

Yes