Table 2 Optical materials for DOEs

From: Broadband unidirectional visible imaging using wafer-scale nano-fabrication of multi-layer diffractive optical processors

Materials

CTE (ppm/°C)

Spectral Range (nm)

n

Note(s)

High-purity fused silica62

0.55

150–3000

~ 1.5

High transparency and extremely low CTE. Thermally stable and chemically inert. High strength and scratch resistance.

Silicon (Si)66

2.6

1000–7000

~ 3.5

Good for IR applications. Moderate CTE. High n translates into tight tolerances for fabrication (etch depth).

Germanium (Ge)66

5.8

2000–20,000

~ 4.0

Good for mid-IR applications. Extensively used as a substrate for the production of optical filters.

Polymer (Plastics)67

130

400–1600

~1.5

Inexpensive but typically higher CTE and lower mechanical strength, and environmental resilience.

Sapphire (Al2O3)68

4.0

150–6000

~1.8

High transparency. High CTE, chemically inert. High cost and limited wafer sizes. Difficult to etch.