Fig. 2: Fabrication and linear optical characterization of WS₂/MoS₂ anapole nanoantennas.

a Fabrication steps of the dual TMDC layer nanoantennas. From left to right: exfoliation and transfer of the thin TMDC films, deposition of the electron beam resist, electron beam lithography writing, gold etching mask deposition, resist lift-off, and final dry etching step and mask removal (not shown). b Height profile of the exfoliated and stacked TMDC layers, before nanofabrication, revealing a total height of 207 nm. c Large area atomic force microscopy (AFM) scan of the final sample after nanofabrication. Electron microscope images of the fabricated sample, for different tilting angles of 50 (d) and 60 (e) degrees. Scale bars: 200 nm. f Linear reflectance spectra of the exfoliated and unpatterned reference of MoS₂ and WS₂, with the relative A (X^A) and B (X^B) exciton energies, and that of the reference double layer unpatterned stack. g Reflectance of a set of WS₂/MoS₂ antennas with radius ranging from 260 nm to 360 nm. The black dashed lines are a Gaussian fit to the relative anapole spectral dip. h Spectral position of the anapole condition, extracted from the fit in panel (g), as a function of the radius. The gray line correspond to the linear dependence predicted from numerical simulations