Fig. 2: μGS device fabrication.
a Graphene is grown on copper foil through chemical vapor deposition (CVD). b The graphene sheet is transferred onto a silicon chip with Ti/Au electrodes. c The graphene is patterned using photolithography to create μGSs. d The μGSs are passivated with a layer of HSQ and then with a layer of Si3N4 through CVD. e PDMS microfluidic channels are plasma bonded onto the passivation layer. f SEM image of the patterned graphene in contact with the metal electrodes. g A photograph of the device under blue light showing the microfluidic channel and tubing
