Table 2 Comparison of stability of various passivation methods
Passivation method | No passivation | HSQ Only | PVD SiO2 | PVD SiO2 /Si3N4 | PMMA | SU8 | Low temp. HSQ/Si3N4 | High temp. HSQ/Si3N4 |
|---|---|---|---|---|---|---|---|---|
Thickness (nm) | N/A | 300 | 50 | 600 | 200 | 1000 | 650 | 440 |
Tfail | <1 min | <1 min | <1 min | <10 min | <10 min | <10 min | 4 h | 39 h |
