Fig. 4: High-temperature strain sensing performance of the flexible MoxW1-xS2 sensors. | Microsystems & Nanoengineering

Fig. 4: High-temperature strain sensing performance of the flexible MoxW1-xS2 sensors.

From: Pulsed laser-assisted direct fabrication of MoxW1-xS2 alloy-based flexible strain sensors with superior performance for high-temperature applications

Fig. 4

a Normalized resistance of the strain sensor responding to repetitive bending-and-releasing tests in the temperature regimes from 20 to 500 °C. Strains of 4.9 to 392 με are subjected to the sensor for three cycles at each strain. b Electrical response to microstrains of 4.9 and 25 με at temperatures of 20, 100, 200, and 300 °C. c Calculated GF of the sensor in the temperature range of 20–500 °C. d Benchmark of GF versus limit of detection with state-of-the-art high-temperature strain sensors based on metals, carbons, semiconductors, and ceramics. e Normalized resistance of the sensor under cyclic loading and unloading test with an applied strain of 392 με at 500 °C

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