Fig. 3: The fabrication process of the hybrid grating.
From: Cross-scale structures fabrication via hybrid lithography for nanolevel positioning
a The whole process of the device, including coating, lithography, and etching. b Exposure process. Exposure I: block the region designated for grating fabrication and expose the code area. Exposure II: change the blocking to expose the 1-dimensional grating. Exposure III: rotate the substrate by 90° and generate 2-dimensional grating patterns. CCD images are used to align the patterns. PR photoresist, S substrate, BLA blocking A, BLB blocking B
