Fig. 10

Built‐in electric fields dramatically induce enhancement of osseointegration and bone defect regeneration. a Illustration showing the built-in electric fields promote implant osseointegration: A built-in electric field is constructed among the endogenous electronegative bone defect wall and the electropositive ferroelectric BiFeO₃ (BFO) nanofilm implant surface. Thus, the rapid and high-quality osseointegration was induced on the implant. b Schematic illustration of the built-in electric fields forming among BFO⁺ nanofilm implants and bone. And the corresponding histological analysis at 2 weeks post-implantation, which showing better osseointegration on BFO⁺ nanofilm implants (NB: nascent bone). c Diagram of quantitative analysis of bone-implant contact (BIC) values. d Diagram of different bone volume/total volume (BV/TV) on the basis of histomorphometry analysis (*P < 0.05, **P < 0.01). e Graphical summary of phases of BFO⁺ nanofilm-trigged osteointegration. Reproduced with permission.²⁸ Copyright 2017, Wiley-VCH