Table 1 An overview of recent works on IMO thin films with their properties.
Technique | Tprocess (°C) | Φ (10−3 Ω−1) | Rs (Ω/▫) | T (%) | ρ (Ω cm) | μ (cm2 V−1 s−1) | n (cm−3) | Mo doping | Thickness (nm) | Substrate |
|---|---|---|---|---|---|---|---|---|---|---|
RF sputteringa | 550 | 97.6 | 1.37 | 81.8 | 4.5 × 10−5 | 109 | 1.3 × 1021 | 4 wt% | 300 | Mica |
PLD23 | 700 | 39.18 | 8.9 | 90 | 8.9 × 10−5 | 138 | 4.7 × 1020 | 2 at% | 100 | Quartz |
AA-CVD15 | 450 | 31.29 | 1.8 | 75 | 1.2 × 10−4 | 119 | 4.4 × 1020 | – | 650 | Glass |
RTE17 | 350 | 21.47 | 5 | 80.0 | 1.8 × 10−4 | 130 | 2.6 × 1020 | 4 wt% | 370 | Glass |
ARE25 | 300 | 18 | 26 | 93 | 6.5 × 10−4 | 24 | 4.0 × 1020 | 3 at% | 250 | Glass |
AACVD26 | 450 | 13.3 | 2.1 | 69.9 | 1.4 × 10−4 | 123 | 3.7 × 1020 | 3.1 at% | 670 | Soda lime glass |
Spray pyrolysis24 | 550 | 10.2 | 1.33 | 83 | 4.0 × 10−4 | 148 | 1.0 × 1020 | 0.5 at% | 300 | Glass |
Mist-CVD21 | 600 | 7.04 | 8 | 75 | 4.4 × 10−4 | 93 | 1.5 × 1020 | 0.8 at% | 550 | Glass |
Co-sputtering27 | 600 | 5.24 | 24.57 | 81.6 | 4.9 × 10−4 | 40 | 2.5 × 1020 | – | 200 | Glass |
Spray pyrolysis28 | 400 | 2.5 | 17.2 | 73 | 6.8 × 10−4 | 90 | 1.0 × 1021 | 0.5 at% | 525 | Glass |
RF sputtering20 | 300 | 1.51 | 71 | 80 | 3.55 × 10−4 | 41.56 | 4.2 × 1020 | 2.36 wt% | 50 | Glass |
RF sputtering22 | 550 | 1.14 | 49.48 | 75.0 | 4.95 × 10−4 | 27 | 4.7 × 1020 | 2.0 wt% | 100 | Soda lime glass |
