Table 2 Gas sensors with potential for analysis of Inorganic compounds in exhaled gases.
Target gas | Sensing material | Synthesis method | Sensing performance | Ref. |
|---|---|---|---|---|
NH3 | CaCl2-infiltrated hydrogel | one-pot polymerization | LOD > 86 ppt | |
PEDOT:PSS NW | soft lithography | LOD >100ppb | ||
CuBr | flame-aerosol deposition, brominated | 90%RH, LOD>5 ppb, 5-5000 ppb | ||
graphene/MXenes | lasering | LOD >5 ppb | ||
ZnO/SnO2 | Electrospinning, hydrothermal method | LOD >10 ppm | ||
Ag-RGO | modified Hummers and Offman method, self-assembly | LOD >5 ppm | ||
PET-PANi-CoFe2O4 | sol–gel combustion technique, In situ chemical oxidative polymerization | LOD >25 ppb, DR: 1-50 ppm | ||
PECOTEX | roll-to-roll coating | DR: 10-1000 ppm | ||
Ce-ZnO-X | spray method | DR: 0.1-10 ppm | ||
TiO2/CNCs | Compound enzymatic hydrolysis, low-temperature liquid phase process | DR: 1.34-435 ppm | ||
PEDOT:PSS/IrOx/hydrogel | chemical methods | DR: 17–7899 ppm | ||
Ti3C2T/RGO | wet-spinning, etch, modified Hummer’s method | LOD >10 ppm | ||
CeO2−CuBr | thermal evaporation, electron beam deposition | LOD >20 ppb | ||
NiO@CuO | chemical methods, electroless deposition | LOD >46.5 ppb | ||
BC/PANi-SSA/PAMPS | static fermentation, chemical methods | DR: 21.3-50 ppm | ||
SiO2/PANI | sol-gel, electrospinning and calcination | LOD >400 ppb | ||
PANi/Fe2O3 | Lyophilization, in situ deposited | LOD >0.3 ppm | ||
CA/PAM | one-pot polymerization method | LOD >3.5 ppb; R=8.4 ppm-1 | ||
NO2 | rGO-ZnFe2O4 | soft lithography, e-beam and thermal evaporation | DR: 50 - 4000 ppb | |
Pt_ZnO/ PRGO | chemical methods | LOD >0.1 ppm | ||
RGOH-(p) | single-step wet process | DR: 0.6-3 ppm | ||
rGO-ZnO NPs | atomic layer deposition, Electron beam-induced deposition | LOD >40 | ||
ZnS NPs/N-rGO | modified Hummer’s method, chemical methods | LOD >69 ppb | ||
g-C3N4/PANi | Electrospinning, doctor blade technique, situ polymerization | DR: 8–108 ppm | ||
WS2xSe2−2x | chemical methods | DR: 10-500 ppm | ||
MWCNT | Lasering, deposition | DR: 5-20 ppm | ||
TCNF/CNT | wet spinning | DR: 0.125-5 ppm | ||
TiO2-spaced RGO | modified Hummer’s method, minimally intensive layer delamination, layer-by-layer assembled | DR: 0.05-20ppm | ||
MoS2-LIG | chemical methods, Laser, drop-casted | LOD >2 ppm | ||
rGO/SnO2 | Hummer’s method, Spraying | DR: 20-100 ppm, R=0.0754+0.00182x(ppm) | ||
Borophene | In situ thermal decomposition method | LOD >200 ppb; DR: 0.2-100 ppm | ||
CNT/a-TiO2 | situ hydrolysis, calcination | LOD >500 ppb | ||
Zn(OTf)2/PAM | assembled layer by layer | LOD >0.1 ppb | ||
SnO2/MXene | self-assembly | LOD >0.03 ppb | ||
YSZ/SnO2/SnS2 | self-sacrificial sulfidation method | DR: 0.02-4 ppm | ||
NO | Cu-TCA/TiO2 | chemical bath deposition, chemical methods | LOD > 140 ppb; R=16.08+7.56X(ppm) | |
LIG | laser | LOD >8.3 ppb, 4.18‰ppm−1 | ||
LM@SnS2 | Sintering, Laser | LOD >1.32 ppb, 1092%/ppm | ||
DPPTT/Cu-BHT-NTs | self-assembly | LOD >5 ppb | ||
In2O3/ZnO | wet-chemical | LOD >100 ppm | ||
H2S | CuO-SWCNT | self-assembly | LOD >100 ppb | |
Fe2O3-MPCNF | Electrospinning | DR: 0.2 - 100 ppm | ||
2D NbWO6 | chemical methods | 150°C, LOD >0.5 ppm | ||
NO2-UiO-66 NM | Electrospinning, spraying aqueous synthesis method | LOD >10 ppb; DR: 1-100 ppm | ||
PEDOT:PSS@Pd | Cross-linking, in-situ growth | DR: 0.25~6% | ||
H2 | Pd/Si NM | Metal depositions | DR: 50−5000 ppm | |
yarn@ Pd@Pt | sputter-deposition, spinning | LOD >1 ppm | ||
CNFs@Ni−Pt | electrospinning | LOD >100 ppm | ||
CNT-Pd | chemical vapor deposition, chemical methods | LOD > 0.1 mol % | ||
Pd NP | mask evaporation deposition | LOD >15 ppm | ||
Cs2PtI6 | chemical methods | LOD >100 ppb | ||
rGO/SnO2/PVDF | mortar pestle, E-beam evaporation | DR: 10-1000 ppm |
