Fig. 5
From: Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition

In situ characterization of the morphological tuning of Pt nanoparticles during ALD. a Selection of 2D GISAXS images measured in situ during a combined process using first 24 cycles of the O2-based Pt ALD process followed by N2 *-based Pt ALD. b 2D color map showing the intensity evolution of the line profiles at the Si Yoneda position indicated by the dashed horizontal lines in a. c Average particle coverage against particle size for O2-based Pt ALD (blue squares), N2 *-based Pt ALD (green circles), and the combined process using first 24 cycles of the O2-based Pt ALD process (left side of the dashed line) to tune the particle coverage followed by N2 *-based Pt ALD (right side of the dashed line) to tune the particle size (yellow triangles). d Representative SEM images and schematic representations of the GISAXS results after (1) 24 O2-based ALD cycles, (2) continued growth with the O2-based ALD process, and (3) continued growth with the N2 *-based ALD process. The white scale bars indicate 50 nm