Fig. 3
TEM characterization of the resulting metal structure. a SEM image of nickel beams fabricated directly on a 200-nm thick SiN membrane TEM grid b Low-magnification TEM of a 100 nm nickel beam overhanging the edge of 1.25-μm hole in a SiN membrane. c TEM image of the metal sample region where the diffraction pattern was taken. d Electron diffraction pattern shows that the printed beam consists mostly out of nanocrystalline nickel with a small amount of nickel oxide. e HRTEM image of a printed metal beam. Analysis of atomic plane distances using FFT shows predominantly nanocrystalline nickel (region 1) with some amount of nickel carbide in the interior (region 2) and nickel oxide at the surface (region 3). f Grain size histogram for n = 40 particles measured from a TEM image showing 95% confidence intervals for the mean grain size (μ) and the standard deviation (σ) (see Supplementary Fig. 2 and Supplementary Table 1). Scale bars are 1 μm for a, 100 nm for b, 50 nm for c, and 5 nm for e
