Fig. 4 | Nature Communications

Fig. 4

From: Replica molding-based nanopatterning of tribocharge on elastomer with application to electrohydrodynamic nanolithography

Fig. 4

EHDL-generated nanocones and nanovolcanos. AFM scans of EHDL results obtained with the UV exposure dose of the two-beam interference lithography set to a–c 1.2 J cm–2, d–f 1.8 J cm–2, and g–i 3.6 J cm–2. The first and second columns show the final textures in the bird’s eye and top views, respectively. The third column shows their cross-sectional profiles along the lines in the second column. While the low dose, narrow-gap EHDL produced nanocone array as shown in the first two rows, the high dose, wide-gap EHDL resulted in a nanovolcano array as shown in the third row. (Scale bars: 1 μm)

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