Fig. 4 | Nature Communications

Fig. 4

From: Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures

Fig. 4

Fabrication of 3D integrated devices from 2D materials and suspended graphene mechanical resonators with a dry and one-step etching process. a Optical microscopic image and schematic illustration of the multi-stacked graphene devices connected with via contacts (the scale bar is 10 μm). Source and drain contacts were denoted as B1 and B2 for bottom graphene device (G1), M1 and M2 for middle graphene device (G2), and T1 and T2 for top graphene device (G3). All the graphene devices are connected with two via contacts (via1 and via2). b Plots of resistance vs. carrier density of multi-stacked three graphene devices in a. The inset shows Ids − Vds curves obtained from two graphene devices connected with via1 or via2. Linear curves and small resistance indicate that these three graphene devices embedded in hBN are electrically connected with low resistance via contacts. c Optical microscopic image and schematic illustration of the hBN-encapsulated graphene device with graphene backgate (the scale bar is 5 μm). d Ids − Vg curve of the graphene device (G2) in c. Gate voltage was applied with bottom graphene (G1). e False-color scanning electron micrograph of the suspended graphene membrane (the scale bar is 2 μm). The inset is a magnified image of the suspended membrane (the scale bar is 1 μm). f Plot of normalized amplitude vs. frequency of the few-layer graphene resonator. Black circles and red solid line are the optomechanical response and Lorentzian fit, respectively

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