Fig. 4
From: A simple and robust approach to reducing contact resistance in organic transistors
AFM images on the Au surface. a Au deposited at 0.5 Ås−1. b Au deposited at 2.5 Ås−1
Fig. 4 | Nature Communications
From: A simple and robust approach to reducing contact resistance in organic transistors
AFM images on the Au surface. a Au deposited at 0.5 Ås−1. b Au deposited at 2.5 Ås−1
