Fig. 2 | Nature Communications

Fig. 2

From: Control of MXenes’ electronic properties through termination and intercalation

Fig. 2

Influence of intercalated species on the MXene resistance and dR/dT. a TGA-MS of Ti3CNTx showing the loss of H2O intercalants and –OH termination species. b In situ EELS of the normalized O K-edge of Ti3CNTx indicating the loss of H2O intercalants with annealing. c Ex situ XRD of the Ti3CNTx (002) peak for an as-prepared thick sample, i.e., vacuum filtered and free-standing, as well as thick samples annealed at 150 °C (in vacuum) and 400 °C (in Ar). The peak shift to higher 2θ values represents a decrease in the inter-layer spacing. The dashed vertical line represents the approximate position of the Ti3C2Tx (002) peak after annealing at 150 °C, taken from ref. 6. d Temperature-dependent PPMS resistance measurements of a thick as-prepared (intercalated) Ti3CNTx sample and the de-intercalated sample annealed to 700 °C within the TEM. RRT is the room temperature resistance. e TGA-MS of Mo2TiC2Tx showing the loss of H2O intercalants and the decomposition of TBA+ intercalants. f Temperature-dependent PPMS resistance measurements of a thick as-prepared (intercalated) Mo2TiC2Tx sample and the de-intercalated sample annealed to 775 °C within the TEM. The as-prepared data is taken from ref. 38. g Schematic of intercalants’ influence on conduction through multi-flake Mo2TiC2Tx

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