Fig. 1
From: Universal perpendicular orientation of block copolymer microdomains using a filtered plasma
Filtered plasma treatment to form the cross-linked layer for perpendicular orientation of BCP microdomains. Schematics of a the plasma assisted process and b the filter which blocks ion bombardment and VUV/UV generated by the argon plasma. Only the Ar neutral particles impinge obliquely on the surface of the film, forming a thin cross-linked layer without composition changes or etching. The cross-linked layer exhibits a neutral surface affinity for the BCPs, so that the perpendicular orientation of the BCP microdomains in the film after annealing can be induced regardless of the type, molecular weight, or fraction of the BCP
