Fig. 1: Schematic of the electrodeposition process for crystalline silicon films production.

a The process starts from abundant and low-cost silicon dioxide in molten calcium chloride-calcium oxide electrolyte at 850 °C. b Direct electrodeposition of p-type, n-type and p-n junction silicon films through a cyclic reaction mechanism. c Schematics of the produced p-type, n-type silicon films and the possible solar cells based on the as prepared p-n junction silicon films.