Fig. 6: Pulse duration dependence of the diffraction imaging process. | Nature Communications

Fig. 6: Pulse duration dependence of the diffraction imaging process.

From: The role of transient resonances for ultra-fast imaging of single sucrose nanoclusters

Fig. 6

Influence of the pulse duration on the beam damage as function of photon energies as well as beam damage for different photon energies as function of pulse length (inset). The calculations are performed for a 1000-unit sucrose cluster exposed to intense XFEL pulses with 25 \(\upmu\)J/\(\upmu\)m\({}^{2}\). The shaded area indicates the water window.

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