Fig. 1: Principle of EAR-enhanced MOKE microscopy.
From: Extreme anti-reflection enhanced magneto-optic Kerr effect microscopy
a, b Schematic of the a conventional and b EAR-enhanced MOKE microscopy. The cooperation of the bottom Al reflector, phase-matching SiO2 layer, and phase-compensation SiO2 layer presents the magnetic material with EAR (right panel). EAR not only suppresses the non-MO reflection of the incident field (Ex) but also enhances the generation of the MO field (Ey). The combination of the suppressed (rxx) and enhanced (rxy) dramatically improves the performance of the MOKE microscopy. Insets, MOKE microscopy images of the bare and EAR Co/Pt films. Scale bar, 50 μm. c, d Simulated electric field amplitude profiles of the bare Co/Pt (c) and EAR Co/Pt (d) films under the normal incidence of the x-polarised planewave. The yellow line represents the position of the planewave source. The wavelength of light is 660 nm. The MO Kerr amplitude, the ratio between |Ex| and |Ey|, is plotted on the log scale.
